Publications
1.
Leblanc, Valerie; Chen, Jianglong; Kang, Sung Hoon; Bulovic, Vladimir; Schmidt, Martin A.
Micromachined Printheads for the Evaporative Patterning of Organic Materials and Metals Journal Article
In: Journal of Microelectromechanical Systems, vol. 16, pp. 394 – 400 , 2007.
@article{Leblanc2007,
title = {Micromachined Printheads for the Evaporative Patterning of Organic Materials and Metals },
author = {Valerie Leblanc and Jianglong Chen and Sung Hoon Kang and Vladimir Bulovic and Martin A. Schmidt},
url = {http://ieeexplore.ieee.org/xpl/login.jsp?tp=&arnumber=4147590&url=http%3A%2F%2Fieeexplore.ieee.org%2Fiel5%2F84%2F4147571%2F04147590.pdf%3Farnumber%3D4147590},
year = {2007},
date = {2007-04-10},
journal = {Journal of Microelectromechanical Systems},
volume = {16},
pages = {394 - 400 },
abstract = {This paper describes the design, fabrication, and testing of electrostatically actuated microshutters used as active shadow masks to pattern evaporated materials. The fabricated microshutters can obstruct a 25-mum-wide aperture at an actuation voltage of 90 V, with a resonant frequency of 4 kHz due to a 400-mum-long actuator. The microshutters integrated with an x-y-z manipulator were used to print patterns of organic material and metal on glass substrates in vacuum with a pixel size of 25 mum. The maximum resolution achievable with this setup is 800 dpi, and we printed active organic light-emitting device arrays of 400 dpi resolution. This printing scheme could enable the patterning of large-area organic optoelectronic devices on diverse substrates.},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
This paper describes the design, fabrication, and testing of electrostatically actuated microshutters used as active shadow masks to pattern evaporated materials. The fabricated microshutters can obstruct a 25-mum-wide aperture at an actuation voltage of 90 V, with a resonant frequency of 4 kHz due to a 400-mum-long actuator. The microshutters integrated with an x-y-z manipulator were used to print patterns of organic material and metal on glass substrates in vacuum with a pixel size of 25 mum. The maximum resolution achievable with this setup is 800 dpi, and we printed active organic light-emitting device arrays of 400 dpi resolution. This printing scheme could enable the patterning of large-area organic optoelectronic devices on diverse substrates.
Note: Send e-mail to Prof. Kang at [email protected] if you need a pdf file of the papers below.
2007
Leblanc, Valerie; Chen, Jianglong; Kang, Sung Hoon; Bulovic, Vladimir; Schmidt, Martin A.
Micromachined Printheads for the Evaporative Patterning of Organic Materials and Metals Journal Article
In: Journal of Microelectromechanical Systems, vol. 16, pp. 394 – 400 , 2007.
Abstract | Links | BibTeX | Tags: Evaporation, Fabrication, Metal, Organic, Patterning, Printing
@article{Leblanc2007,
title = {Micromachined Printheads for the Evaporative Patterning of Organic Materials and Metals },
author = {Valerie Leblanc and Jianglong Chen and Sung Hoon Kang and Vladimir Bulovic and Martin A. Schmidt},
url = {http://ieeexplore.ieee.org/xpl/login.jsp?tp=&arnumber=4147590&url=http%3A%2F%2Fieeexplore.ieee.org%2Fiel5%2F84%2F4147571%2F04147590.pdf%3Farnumber%3D4147590},
year = {2007},
date = {2007-04-10},
journal = {Journal of Microelectromechanical Systems},
volume = {16},
pages = {394 - 400 },
abstract = {This paper describes the design, fabrication, and testing of electrostatically actuated microshutters used as active shadow masks to pattern evaporated materials. The fabricated microshutters can obstruct a 25-mum-wide aperture at an actuation voltage of 90 V, with a resonant frequency of 4 kHz due to a 400-mum-long actuator. The microshutters integrated with an x-y-z manipulator were used to print patterns of organic material and metal on glass substrates in vacuum with a pixel size of 25 mum. The maximum resolution achievable with this setup is 800 dpi, and we printed active organic light-emitting device arrays of 400 dpi resolution. This printing scheme could enable the patterning of large-area organic optoelectronic devices on diverse substrates.},
keywords = {Evaporation, Fabrication, Metal, Organic, Patterning, Printing},
pubstate = {published},
tppubtype = {article}
}
This paper describes the design, fabrication, and testing of electrostatically actuated microshutters used as active shadow masks to pattern evaporated materials. The fabricated microshutters can obstruct a 25-mum-wide aperture at an actuation voltage of 90 V, with a resonant frequency of 4 kHz due to a 400-mum-long actuator. The microshutters integrated with an x-y-z manipulator were used to print patterns of organic material and metal on glass substrates in vacuum with a pixel size of 25 mum. The maximum resolution achievable with this setup is 800 dpi, and we printed active organic light-emitting device arrays of 400 dpi resolution. This printing scheme could enable the patterning of large-area organic optoelectronic devices on diverse substrates.